|
相关介绍:
物理学报 2001, Vol. 50 Issue (7): 1396-1400
顾有松1, 张永平2, 高鸿钧2, 张秀芳2
(1)北京科技大学材料物理系,北京100083; (2)中国科学院物理研究所,凝聚态物理中心北京真空物理实验室,北京100080
STRUCTURAL CHARACTERIZATION OF C3N4 THIN FILMS SYNTHESIZED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION
GU YOU-SONG1, ZHANG YONG-PING2, GAO HONG-JUN2, ZHANG XIU-FANG2
物理学报 2001, Vol. 50 Issue (7): 1396-1400
顾有松1, 张永平2, 高鸿钧2, 张秀芳2
(1)北京科技大学材料物理系,北京100083; (2)中国科学院物理研究所,凝聚态物理中心北京真空物理实验室,北京100080
STRUCTURAL CHARACTERIZATION OF C3N4 THIN FILMS SYNTHESIZED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION
GU YOU-SONG1, ZHANG YONG-PING2, GAO HONG-JUN2, ZHANG XIU-FANG2
引用本文:
张永平,顾有松,高鸿钧 等 . 微波等离子体化学气相沉积法制备C3N4薄膜的结构研究. 物理学报, 2001, 50(7): 1400.
Cite this article:
ZHANG YONG-PING,GU YOU-SONG,GAO HONG-JUN et al. STRUCTURAL CHARACTERIZATION OF C3N4 THIN FILMS SYNTHESIZED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Phys. Sin., 2001, 50(7): 1396-1400.
下载:
微波等离子体化学气相沉积法制备C3N4薄膜的结构研究.pdf
(214.99 KB, 下载次数: 4)
|
|